Intel Corporation has announced the opening of its newest dedicated high-volume microprocessor manufacturing facility using the company's advanced 0.13 micron process.
The company invested $2bn to construct and equip the new US facility, which will produce microprocessors based on Intel's copper-based 0.13 micron process technology on 200mm wafers.
The 0.13 micron technology enables the world's fastest transistor in production, which is the foundation for fast microprocessors. The circuits created by this technology are so small that it would take roughly 1,000 of them to equal the thickness of a human hair.
Robert Baker, vice president and general manager of Intel's Technology and Manufacturing Group said "Intel's investment in Fab 22 reflects our commitment to remain the leader in semiconductor manufacturing and technology. This focus on our core competencies gives us a competitive advantage through the scale of our operations, the agility of our factory network and consistent execution worldwide."
Fab 22 contains approximately 133,000 square feet of cleanroom space out of a total of 360,000 square feet that make up the facility. A new four-story, 320,000 square foot manufacturing support building and a 123,000 square foot central utility building were also completed as part of the project.
Fab 22 was built in a record 18 months, with an exemplary safety record and by more than 4,200 construction workers. More than 1,000 engineers, technicians and support people have already been hired to work at Fab 22. Intel currently employs 10,000 people in Chandler.
Intel, the world's largest chip maker, is also a leading manufacturer of computer, networking and communications products