M 2000 range of Spectroscopic Ellipsometres available from Scientific Solutions
M 2000 Spectroscopic Ellipsometres
Scientific Solutions has entered into a distribution agreement with JA Woolam Co Inc, USA, manufacturers of Spectroscopic Ellipsometres for non-destructive thin film and bulk material characterisation.
Spectroscopic ellipsometry (SE) has become the standard for measuring thin film thickness and optical constants (n and k).
Spectroscopic ellipsometry is used for characterization of all types of materials: dielectrics, semiconductors, metals, organics, and more.
Scientific Solutions offer Ellipsometres covering a spectral range to meet any need (from the vacuum UV to the far IR). Many upgrade options are available with our Ellipsometres: automated sample translation, variable temperature (heating or cooling), focusing optics, liquid cells, etc.
The M-2000 spectroscopic Ellipsometre has an advanced optical design, large spectral range, and fast data acquisition time. These features makes it ideal for in-situ process monitoring and control, quality control, uniformity mapping and more. The entire spectrum of data is acquired in a fraction of a second.
M-2000U - Model "U" (for ultraviolet) Ellipsometre is ideal for a large variety of applications, including both in-situ and ex-situ measurements of dielectrics, polymers, semiconductors, metal, etc.
A spectral range from 245nm to 1000nm covers critical pints in semiconductors, making it useful for measuring and controlling compound semiconductor alloy ratios.
A broad range of film thicknesses (sub-nanometre to 10 microns) are accessible with its resolution of 470 simultaneously measured wavelengths.
M-2000V - Model "V" (for visible) Ellipsometre uses a QTH lamp to reduce both the system and operating cost. The compact optics makes it quite convenient to mount on a chamber for in-situ use. The spectral range (370nm to 1000nm, 390 wavelengths) is ideal for measurements of dielectrics, amorphous semiconductors, polymers, etc
M-2000D - Model "D" Ellipsometre measures 500 wavelengths covering 193 to 1000nm, this is ideal for semiconductor applications. Measure optical constants at each lithograph line (193nm, 248nm, 365nm).
Fast measurement speeds covering a large spectral range allow fast uniformity maps of refractive index and thickness.
8-Jun-2007