Duff & MacIntosh P/L ’s Alicat Scientific has recently announced its intention to begin working in the semiconductor space by introducing its line of ultra-low flow (0.5SCCM - 50SCCM) Alicat Mass Flow Controllers to the semiconductor manufacturing industry.
Semiconductor manufacturing processes such as chemical vapor deposition (CVD), physical vapor deposition (PVD), thin film, sputtering, and backside wafer cooling call for a MFC that has the ability to control below 5SCCM.
With patented internally compensated laminar flow technology, Alicat can control at flow rates as low as 0.5SCCM full scale with a control range of 1% - 100% full scale and a control response time of less than 100ms with 1% accuracy.
Alicat devices are NIST and CE certified and have standard 14 gas user selectable calibration and a small footprint for easy mounting.
Alicat MFCs also come standard with a dynamic display allowing the user to quickly view the status of the device, change the values of the PID control loop and view several parameters including mass flow, volumetric flow, psia, and temperature.
A variety of customizable components are available including totaliser function and a variety of fittings.
Alicat Scientific is a Tucson, AZ based manufacturer of mass flow instrumentation based on a patented technology of laminar flow. Alicat has been making mass flow instrumentation since 1992. Alicat currently has over 22,000 mass flow control products in use worldwide.