The Kawasaki, Japan-based Toshiba Nanoanalysis Corporation has selected the new ZEISS Xradia 520 Versa 3D X-ray microscope (XRM) to expand the capabilities of its busy analysis lab.
Toshiba Nanoanalysis offers imaging services for complex analytical demands in semiconductor, biosciences and materials science research for industry and academia.
Mr Koichiro Tomoda, General Manager of the Evaluation and Analysis Technology Center explained that the major appeal for the Toshiba Nanoanalysis lab services team was the XRM’s unprecedented flexibility. They are confident the Xradia 520 Versa will enable them to expand the capabilities of their lab to study even more diverse materials.
Designed for studying hard-to-image materials and the evolution of their microstructures within industrial and scientific laboratory environments, the Xradia 520 Versa extends the boundaries of non-destructive 3D imaging in situ and in 4D (over time) with advanced contrast tuning capabilities, extensive filtering options, and enhancements delivering greater accuracy and workflow efficiency.
Mr Vahan Tchakerian, Vice President of Global Sales for Carl Zeiss X-ray Microscopy comments that Toshiba is expanding its use of the ZEISS Xradia Versa family of 3D XRM, making Toshiba Nanoanalysis well-positioned to lead the 3D analysis market in central Japan.
The Xradia 520 Versa leverages ZEISS Xradia synchrotron-calibre optics and industry-best resolution and contrast capabilities for a wide variety of sample types and sizes. Key features include Dual-Scan Contrast Visualizer (DSCoVer) for Compositional Contrast; High-Aspect Ratio Tomography (HART); Automated Filter Changer; and in-situ Interface Kit.
Toshiba Nanoanalysis recently introduced the capabilities of their Xradia 520 Versa at Semicon Japan, inviting industrial and academic scientists to discuss their non-destructive 3D research requirements.