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Innovation reduces neon gas use in lithography

Editorial
article image The new eGTM function for the ArF Immersion Lasers reduces neon gas consumption by 50%.

JAPANESE lithography light source manufacturer Gigaphoton has unveiled a new function for its lasers that cuts down on consumption of neon gas.

The new eGTM function for the ArF Immersion Lasers reduces neon gas consumption by 50%, and also provides real-time monitoring of gas usage.

Today, ArF immersion lasers used for leading-edge semiconductor fabrication utilize a mixture of neon, fluorine, and argon gases as a laser gas, with neon gas accounting for more than 96% of the laser gas mixture.

However, world production of neon gas has been reduced recently, raising the possibility that the price of neon gas will rise in the near future.

The eTGM function closely monitors the laser running status, thereby allowing the injection amount and discharge amount of laser gas to be optimised.

According to Gigaphoton, the eTGM function cuts the consumption of neon gas by half without lowering the laser performance.

In addition, along with introduction of the eTGM function, a new “green monitoring” function is also provided as an upgrade for the paddle of the laser. This upgrade allows the user to monitor the consumption of laser gas in real time under a production environment.

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